Alicyclic methacrylate compounds having an oxygen substituent group on their -methyl group, represented by formula (1), are novel wherein R¹ is H or C₁-C₁₀ alkyl which may contain a halogen atom, hydroxyl group, ether bond, carbonyl group, carboxyl group or cyano group, and R² is a monovalent C₃-C₂₀ organic group having an alicyclic structure. Polymers prepared from these alicyclic methacrylate compounds have improved transparency, especially at the exposure wavelength of an excimer laser, and improved dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, show a high resolution, allow smooth development, lend themselves to micropatterning, and are thus suitable as micropatterning material for VLSI fabrication ##STR1##