High-saturation magnetization composite soft magnetic films can be
deposited with sintered targets made of preferably at least two kinds of powders/elements
with much lower saturation magnetization than that of the deposited soft magnetic
films. Such a high-saturation magnetization composite soft magnetic film can be
deposited by sputtering a plurality of species from a sintered target that forms
a film of a material of higher saturation magnetization than that of the species.