A photoresist composition having (A) at least two polymers selected from the
group
consisting of: (a) a fluorine-containing copolymer comprising a repeat unit derived
from at least one ethylenically unsaturated compound characterized in that at least
one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing
protected acid groups, said polymer comprising one or more branch segment(s) chemically
linked along a linear backbone segment; (c) fluoropolymers having at least one
fluoroalcohol group having the structure: —C(Rf)(Rf)OH wherein Rf
and Rf are the same or different fluoroalkyl groups of from 1 to about
10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10;(d) amorphous
vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole or CX2CY2 where
X=F or CF3 and Y=H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole)
and CX2CY2; and (e) nitrile/fluoroalcohol-containing polymers prepared
from substituted or unsubstituted vinyl ethers; and (B) at least one photoactive component.