The photoresist stripping composition of the present invention contains at least one oxymethylamine compound represented by the following formula 1: ##STR1##

wherein R1 to R3 are as defined in the specification. Of the oxymethylamine compound of the formula 1, the compound represented by the following formula 7: ##STR2##

wherein R2 to R5 and n are as defined in the specification, is a novel compound.

 
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