The photoresist stripping composition of the present invention contains at least one oxymethylamine compound represented by the following formula 1: ##STR1##

wherein R¹ to R³ are as defined in the specification. Of the oxymethylamine compound of the formula 1, the compound represented by the following formula 7: ##STR2##

wherein R² to R⁵ and n are as defined in the specification, is a novel compound.