A photolithography system includes a photolithography apparatus adapted to perform a photolithography process on a wafer; and a control system adapted to control the photolithography apparatus. The control system includes a measurement unit adapted to measure one or more characteristics of a feature formed on the wafer by the photolithography process and to generate therefrom measured data, and a first server adapted to store a destination address where the measured data may be remotely accessed, and adapted to transmit the measured data to the destination address via a network connection. The destination address may be an e-mail address, in which case the first server transmits the measured data in an e-mail message accessible at a destination terminal connected to the network.