An optical system for ultraviolet light having wavelengths
.lamda..ltoreq.200 nm, which may be designed in particular as a
catadioptric projection objective for microlithography, has a plurality
of optical elements including optical elements made of synthetic quartz
glass or a fluoride crystal material transparent to a wavelength
.lamda..ltoreq.200 nm. At least two of the optical elements are utilized
for forming at least one liquid lens group including a first delimiting
optical element, a second delimiting optical element, and a liquid lens,
which is arranged in an interspace between the first delimiting optical
element and the second delimiting optical element and contains a liquid
transparent to ultraviolet light having wavelengths .lamda..ltoreq.200
nm. This enables effective correction of chromatic aberrations even in
the case of systems that are difficult to correct chromatically.