Techniques for processing magnetic devices are provided. In one aspect, a method of processing a magnetic device including two or more anti-parallel coupled layers comprises the following steps. A magnetic field is applied in a given direction to orient a direction of magnetization of the two or more anti-parallel coupled layers. The direction of the applied magnetic field is rotated in relation to a positioning of the two or more anti-parallel coupled layers to counteract at least a portion of a change in a direction of magnetization experienced by at least one of the two or more anti-parallel coupled layers when the applied magnetic field is reduced.