The present invention relates to a photosensitive resin composition, a
preparation method thereof, and a dry film resist comprising the same.
More particularly, the photosensitive resin composition of the present
invention is directed to a photosensitive resin composition including a)
an alkali-soluble acrylate resin, b) a cross-linking monomer having at
least two ethylenic double bonds, and c) a phosphine oxide based
photopolymerization initiator and an acridon based photopolymerization
initiator. According to the photosensitive resin composition and the dry
film resist, it is easy to finely pattern using a laser direct image with
high density and the dry film has excellent sensitivity, resolution, and
adhesiveness to the substrate.