There is disclosed a pellicle 1 for photolithography comprising, a pellicle frame 2 for constituting a pellicle for photolithography, wherein the frame is made of an aluminum alloy whose surface is anodized, and each content of sulfate ion, nitrate ion, chlorine ion, and organic acid (total of oxalic acid, formic acid, and acetic acid) is 1.1 ppm or less in elution concentration after immersed in 100 ml of pure water at 25.degree. C. for 168 hours, per 100 cm.sup.2 of a surface area of the frame, and a pellicle film 3 that is adhered to one end face of the frame. Thereby, there can be provided a pellicle that can effectively prevent haze from being generated on a mask substrate even in a photolithography process with a wavelength being shorter.