The present invention provides a chemically amplified positive resist composition comprising (i) a polymer which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, (ii) an acid generator, and (iii) a compound of the formula (I). The present invention also provides an ester derivative useful as a component of the chemically amplified positive resist composition, and process for producing the ester derivative.

 
Web www.patentalert.com

< Water soluble resin composition, method of pattern formation and method of inspecting resist pattern

< Inkjet-imageable lithographic printing members and methods of preparing and imaging them

> Electrode-forming composition for field emission type of display device, and method using such a composition

> Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition
~ 00274