A lithography equipment is provided, which includes: a coater coating a substrate with resist; a first buffer storing the substrate supplied from the coater; a baker baking the substrate supplied from the first buffer; a first turn table rotating the substrate supplied from the baker; a first transferor communicating the substrate with the coater, the first buffer, the baker, and the first turntable; an exposer exposing light to the substrate supplied from the first turntable; a developer developing the resist on the substrate supplied from the exposer; and a second transferor communicating the substrate with the first turntable, the exposer, and the developer.