A pattern forming method includes the following teps. A resist pattern is formed on a to-be-processed film. A mask pattern including the resist pattern and a resin film formed on a surface of the resist pattern is formed. Slimming of the mask pattern is executed.

 
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< Photosensitive resin composition and method of forming a pattern using the composition

< Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern using the photoresist composition

> Photosensitive resin composition, ink jet recording head using such composition and method for manufacturing such recording head

> Alkali-soluble resin with polyaromatic group and photosensitive composition comprising the resin
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