The invention relates to a photoresist composition comprising a polymeric binder; a photoactive component; and at least one dissolution inhibitor comprising a paraffinic or cycloparaffinic compound containing at least one functional group having the structure --C(R.sub.f)(R.sub.f')OR wherein R.sub.f and R.sub.f' are the same or different fluoroalkyl groups of from one or taken together are (CF.sub.2).sub.a wherein a is an integer ranging from 2 to about 10 and R is a hydrogen atom or an acid labile protecting group. Typically, the dissolution inhibitor has an absorption coefficient of less than about 4.0 .mu.m at a wavelength of 157 nm.