A method of processing a substrate comprising depositing a layer comprising amorphous carbon on the substrate and then laser annealing the substrate is provided. Optionally, the layer further comprises a dopant selected from the group consisting of nitrogen, boron, phosphorus, fluorine, and combinations thereof. In one aspect, the layer comprising amorphous carbon is an anti-reflective coating and an absorber layer that absorbs electromagnetic radiation emitted by the laser and anneals a top surface layer of the substrate.

 
Web www.patentalert.com

< Method and circuit to combine cache and delay line memory

< Carnation plant named `CFPC Evermore`

> Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing

> Matrix-assisted laser desorption and ionization (MALDI) sample plate releasably coupled to a sample plate adapter
~ 00288