An improved etching and cleaning composition for semiconductor devices is provided in which the etch solution incorporates a novel surfactant comprising a combination of a linear perfluorocarboxylic acid, a cyclic amine and an aliphatic alcohol.

 
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< Process for the preparation of optically active amines or salts thereof

< Malonic acid monomethyl derivatives and production process thereof

> Image forming composition and photosensitive lithographic plate using same

> Lubricant composition containing phosphorous, molybdenum, and hydroxy-substituted dithiocarbamates
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