A method of operating a substrate processing chamber that includes, prior
to a substrate processing operation, flowing a seasoning gas comprising
silane and oxygen into said chamber at a flow ratio of greater than or
equal to about 1.6:1 oxygen to silane to deposit a silicon oxide film
over at least one aluminum nitride nozzle exposed to an interior portion
of the chamber. Also, a substrate processing system that includes a
housing, a gas delivery system for introducing a seasoning gas into a
vacuum chamber, where the gas delivery system comprises one or more
aluminum nitride nozzles exposed to the vacuum chamber, a controller and
a memory having a program having instructions for controlling the gas
delivery system to flow a seasoning gas that has an oxygen to silane
ratio greater than or equal to about 1.6:1 to deposit a silicon oxide
film on the aluminum nitride nozzles.