An objective of the present invention is to provide an antireflection film having a fine particle layer that is formed on a transparent substrate without allowing particles to aggregate as irregular lumps, while the region having no particles is being reduced to an area that is sufficiently small so as not to impair the visibility. In order to achieve the above-mentioned objective, the present invention provides an antireflection film that is characterized by having: a transparent substrate and a fine particle layer that is placed on the surface of the transparent substrate and made from at least a single layer of fine particles, wherein the surface of the transparent substrate and fine particles are allowed to adhere to each other by at least an electrostatic interaction, while the bulk of the above-mentioned fine particle layer is set to have a refractive index lower than the refractive index of the above-mentioned transparent substrate.

 
Web www.patentalert.com

> Method for photolithography in semiconductor manufacturing

~ 00300