A composition which provides stain resistance and soil resistance to substrates comprising a copolymer of Formula 1 wherein D is at least one vinyl monomer selected from the group consisting of aryl olefin, vinyl ether, allyl ether, alpha olefin and diene; each M is independently H, NH.sub.4, Ca, Mg, Al, or a Group I metal; R is H, a C.sub.1-C.sub.16 alkyl group, or an arylalkyl group; R.sub.f is a fully fluorinated straight or branched C.sub.2 to C.sub.20 aliphatic radical, or mixture thereof, which is optionally interrupted by at least one oxygen atom; x is 1 to about 10, or a mixture thereof; k and h are each independently a positive integer; i and j are each independently zero or a positive integer, provided that i and j are not both simultaneously zero; the molar ratio of k to (h+i+j) is from about 3:1 to about 1:3, and the molar ratio of h to (i+j) is from about 1:99 to about 22:78 is disclosed.

 
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