The present invention provides a liquid drop discharge apparatus capable of flushing in which the adverse effect on film deposition and patterning and the contamination of the apparatus are prevented without impairing productivity and a driving method of the same, an apparatus and a method for film deposition are provided. The liquid drop discharge apparatus can include a liquid drop discharge head configured to reciprocate in the X-axis direction with a plurality of nozzles arranged lengthwise and crosswise, a flushing area disposed on at least one side of a substrate on a stage, and a control device for controlling an operation by the liquid drop discharge head, in which the liquid drop discharge head is disposed obliquely toward the X-axis direction. The control device control the liquid drop discharge head to perform a flushing operation inside the flushing area while moving it, and the control device can control the entire nozzles to stop the flushing operation when at least one nozzle reaches the position outside the predetermined flushing area.