A method of manufacturing an electro-optical device, the electro-optical device having an electro-optical element formed by laminating a first electrode, an electro-optical layer, and a second electrode in sequence on a base body, the method of manufacturing the electro-optical device, including the steps of: forming an ultraviolet absorbing layer on the substrate by a vapor deposition method so as to cover the electro-optical element; and forming a gas barrier layer by a vapor deposition method using plasma so as to cover the ultraviolet absorbing layer.

 
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> Film for copper diffusion barrier

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