Fluorinated polymers, photoresists and associated processes for
microlithography are described. These polymers and photoresists are
comprised of a fluoroalcohol functional group which simultaneously
imparts high ultraviolet (UV) transparency and developability in basic
media to these materials. The materials of this invention have high UV
transparency, particularly at short wavelengths, e.g., 157 nm, which
makes them highly useful for lithography at these short wavelengths.