An exposure apparatus for exposing a subject to a pattern. The apparatus includes an update system to update a parameter necessary for processing in the exposure apparatus through measurement, a setting system to set a validity period of the parameter updated by the update system, and a control system to cause the update system to perform an update based on the validity period. Prior to execution of a unit of the processing, the control system determines whether the update by the update system is to be performed, based on a predicted completion time of the unit and the validity period.