A polymer for imparting repellency and stain resistance to substrates is disclosed of Formula 1: (W).sub.a(R.sup.2).sub.b--Si(R.sup.1).sub.2--O--[Si(R.sup.1).sub.2--O].su- b.n--[Si(W).sub.c(R.sup.1).sub.d(R.sup.2).sub.e--O].sub.m--Si(R.sup.1).sub- .2--(W).sub.f(R.sup.2).sub.g wherein: a, b, c, d, e, f and g are each independently 0 or 1, provided that (a+b) is 1, (f+g) is 1, and (c+d+e) is 2, each R.sup.1 is divalently a C.sub.1 to C.sub.8 alkyl, each R.sup.2 is independently H or C.sub.1 to C.sub.8 alkyl, optionally containing oxygen, nitrogen, or sulfur, or a combination thereof, n=0 to 500, m=1 to 100, each W is independently (R.sub.f--X-A-X).sub.p--Y wherein: R.sub.f is a straight or branched perfluoroalkyl group having from about 2 to about 20 carbon atoms, or a mixture thereof, which is optionally interrupted by at least one oxygen atom, each X is independently an organic divalent linking group having from about 1 to about 20 carbon atoms, optionally containing oxygen, nitrogen, or sulfur, or a combination thereof, A is a 1, 2, 3-triazole, p=0 to 2, and Y is O, OR, N, NR or N(R).sub.2 wherein R is H or C.sub.1 to C.sub.20 alkyl, optionally containing oxygen, nitrogen, or sulfur, or a combination thereof.