An exposure apparatus includes a projection device for projecting a pattern drawn on a surface of a master, a stage apparatus which moves at least a substrate of the master and a substrate relative to the projection device, and an exposure device for repeatedly exposing the substrate to the pattern of the master. A plurality of pipes connected to movable units of the stage apparatus are joined to each other at partial outer surfaces of the pipes and constitute an integrated pipe array. Electrical cables or signal line cables connected to the movable unit pass through hollow portions of some of the pipes serving as the integrated pipe array.