Spectroscopic ellipsometer system(s) mediated methodology for quantifying layer defining parameters in mathematical models of samples which contain a plurality of layers of different materials, at least some of which are absorbing of electromagentic radiation, wherein an acquired data set is not sufficient to allow definite one for one parameter evaluation, and wherein a global fit procedure can be applied to obtain good parameter starting values for use in a parameter evaluating regression procedure.

 
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> Optical interrogation systems with reduced parasitic reflections and a method for filtering parasitic reflections

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