New oxime sulfonate compounds of the formula I, II, III, IV, V, VI and VII ##STR00001## ##STR00002## R.sub.1 is for example C.sub.1 C.sub.18alkylsulfonyl, R.sub.2 is halogen or C.sub.1 C.sub.10haloalkyl; R.sub.3 is for example unsubstitude or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar.sub.1 is for example a direct bond, C.sub.1 C.sub.12alkylene; --O--C-bond or a --O--Si-bond which cleaves upon the action of an acid; A.sub.1, A.sub.2, A.sub.3, A.sub.4, A.sub.5, A.sub.6, A.sub.7, A.sub.8, A.sub.9, A.sub.10, A.sub.11 and A.sub.12 are for example a direct bond, --O--, or --S--, or are C.sub.1 C.sub.12alkylene or phenylene unsubstituted or substituted; Y.sub.1 is C.sub.1 C.sub.12alkylene which is for example substituted by OR.sub.4, or SR.sub.7; Y.sub.2 is e.g. a trivalent radical of C.sub.1 C.sub.12alkylene; Y.sub.3 is e.g. a tetravalent radical of C.sub.1 C.sub.12alkylene; X is halogen; Ar'.sub.1 is for example C.sub.1 C.sub.12alkyl which is unsubstituted or substituted; Ar''.sub.1 is for example phenylene; provided that at least one of the radicals Ar'.sub.1, Ar''.sub.1, is substituted by 1 to 3 groups of ##STR00003## example halogen; R.sub.15, R.sub.16, R.sub.17 and R.sub.18 e.g. hydrogen or phenyl; R.sub.19, R.sub.20, R.sub.21, R.sub.22 R.sub.23 are e.g. phenyl; are especially suitable for the preparation of photoresists.