This invention relates to organometallic precursor compounds represented by the formula (L)M(L').sub.2(NO) wherein M is a Group 6 metal, L is a substituted or unsubstituted anionic ligand and L' is the same or different and is a .pi. acceptor ligand, a process for producing the organometallic precursor compounds, and a method for producing a film, coating or powder from the organometallic precursor compounds.