A basic developer/quencher solution formulated to include at least one
supercritical fluid or liquid solvent and a base may be used to quench a
photo-generated acid within a photoresist as well as develop the
photoresist. The supercritical fluid or liquid solvent may be carbon
dioxide and the base may be quaternary ammonium salt that has side groups
that increase the solubility of the quaternary ammonium salt in carbon
dioxide.