A substrate holder includes a base; a first holding portion which is formed on the base and which attracts and holds a substrate; and a second holding portion which is formed on the base and which attracts and holds a plate member in the vicinity of the substrate attracted and held by the first holding portion. In an exposure apparatus including such a substrate holder, the plate can be exchanged easily, thereby making the maintenance of the apparatus easy. Consequently, such an exposure apparatus is suitable for immersion exposure.

 
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