A method of determining optical constants n and k for a film on a
substrate is described. Optical measurements are preferably performed
with an integrated optical measurement system comprising a reflectometer,
spectral ellipsometer, and broadband spectrometer such as an Opti-Probe
series tool from Therma-Wave. A beam profile reflectometer is employed to
first determine the thickness of said film from a best fit of modeling
data to experimental data. The thickness data is combined with the
ellipsometer and spectrometer measurements to produce an experimental
data output which is fitted with modeled information to determine a best
fit of the data. Constants n and k are derived from the best fit of data.
The method provides a higher accuracy for n and k values than by standard
procedures which calculate n, k, and t simultaneously. The method may
also be applied to bilayer or multi-layer film stacks.