An exposure apparatus includes a projection optical system having a plurality of optical elements. A first space, which is disposed on a side of a lower surface of an optical element closest to an image plane of the projection optical system, is filled with a liquid. A second space, which is disposed on a side of an upper surface of the optical element and which is independent from the first space, is filled with a liquid. An exposure light beam is radiated onto a substrate through the liquid in the first space and the liquid in the second space to expose the substrate. An optical element, which is next closest to the image plane with respect to the optical element, is prevented from any pollution with the liquid.