A device and a method used when coating a wafer is described. The fluid coating is provided by an inside coating as well as an edge coating. The fluid chocolate in a container is stirred by displacing a vat up and down. During this displacement, the vat will be brought in contact with the wafer, so the chocolate substance, which is provided in there, provides an edge coating. Displacement of the first vat provides a repression of the chocolate substance, which through a nozzle is injected into the wafer in order to provide an inside coating. By repression, a pumping occurs, which is interrupted substantially simultaneously with the edge of the wafer getting in contact with the surface of the chocolate in vat, when it is elevated up towards the wafer, which is suspended in a commonly known apron conveyor (not shown).