A method includes providing a polymerized optical film structure having a microstructured surface, forming a scratch having a length on the microstructured surface to form a scratched optical film, illuminating the scratched optical film to form an illuminated scratch, measuring a plurality of scratch contrast ratio values along the length of the illuminated scratch with a detector, and determining a maximum scratch contrast ratio from the plurality of scratch contrast ratio values along the length of the scratch.

 
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> System and method for imaging sub-surface polarization-sensitive material structures

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