A thin film deposition method for producing an optical film with an
optical characteristic on a deposition substrate in a vacuum chamber is
provided. The method may include preparing in the vacuum chamber a
deposition source which is a source of the film producing material;
holding the deposition substrate with a substrate holding member;
arranging the deposition substrate and the deposition source such that,
given that a vertical distance from the center of the deposition
substrate to the deposition source is defined as ZK and a horizontal
distance between the deposition substrate and the deposition source as
Xk, Xk/Zk is set to satisfy a following equation
0.48.ltoreq.Xk/Zk.ltoreq.0.78; rotating the deposition substrate on a
rotational axis which is orthogonal to the deposition substrate; and
evaporating the film producing material of the deposition source to
perform deposition on the deposition substrate.