In a semiconductor laser element: a lower cladding layer of a first conductivity type, a quantum-well active layer, an upper cladding layer of a second conductivity type, a contact layer of the second conductivity type, and a first electrode of the second conductivity type are formed in this order above a surface of a semiconductor substrate of the first conductivity type, and a second electrode of the first conductivity type is formed below the lower cladding layer. An optical guide layer is arranged between the quantum-well active layer and one or each of the lower cladding layer and the upper cladding layer. The whole or a portion of the optical guide layer contains a dopant so as to realize a carrier concentration of 3.0.times.10.sup.17 cm.sup.-3 or higher.

 
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> Semiconductor laser element, method of fabrication thereof, and multi-wavelength monolithic semiconductor laser device

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