Under the condition that a semiconductor maker and a photomask maker are
separated but these are mutually connected with a communication line, the
semiconductor maker gives a photomask fabrication schedule information to
the photomask maker via the communication line, while the photomask maker
fabricates the photomask depending on such fabrication schedule
information and delivers the photomask to the semiconductor maker. The
photomask maker periodically sends, in the course of fabrication process,
a photomask fabrication progress information to the semiconductor maker
via the communication line. The semiconductor maker regenerates the
photomask fabrication schedule information depending on the photomask
fabrication progress information sent from the photomask maker and then
transfers the re-generated photomask fabrication schedule information to
the photomask maker via the communication line. Therefore, mismatch
between fabrication of semiconductor integrated circuit device and supply
of photomask can be reduced or eliminated.