The present invention provides a method for tiling an integrated circuit having a critically matched device such as a transistor. The method obtains an advantage of automatically improving metallic density over critically matched devices thus yielding improved CMP. The method may include the steps of: identifying critically matched devices in the integrated circuit; placing metal tiles over the critically matched device; performing a density test around each critically matched device; and if a density test is not satisfied around a critically matched device, placing at least one metal strip over a critically matched device.