A method which lower the series resistance of photosensitive devices
includes providing a transparent film of a first electrically conductive
material arranged on a transparent substrate; depositing and patterning a
mask over the first electrically conductive material, such that openings
in the mask have sloping sides which narrow approaching the substrate;
depositing a second electrically conductive material directly onto the
first electrically conductive material exposed in the openings of the
mask, at least partially filling the openings; stripping the mask,
leaving behind reentrant structures of the second electrically conductive
material which were formed by the deposits in the openings of the mask;
after stripping the mask, depositing a first organic material onto the
first electrically conductive material in between the reentrant
structures; and directionally depositing a third electrically conductive
material over the first organic material deposited in between the
reentrant structures, edges of the reentrant structures aligning
deposition so that the third electrically conductive material does not
directly contact the first electrically conductive material, and does not
directly contact the second electrically conductive material.