The present invention provides an exposure apparatus can suppress the
occurrence of residual liquid. An exposure apparatus (EX) comprises: a
first stage (ST1) that holds the substrate (P) and is movable; a second
stage (ST2) that is movable independently of the first stage (ST1); and a
liquid immersion mechanism (12, and the like) that forms a liquid
immersion region (LR) of a liquid (LQ) on an upper surface of at least
one stage of the first stage (ST1) and the second stage (ST2); wherein, a
recovery port (51) that is capable of recovering the liquid (LQ) is
provided to the upper surface of the second stage (ST2).