An exposure apparatus exposes a substrate to light via a reticle while the substrate and the reticle are scanned based on information regarding a shape of the reticle. A projection optical system projects a reticle pattern onto the substrate and a reticle stage holds the reticle and moves in the scanning direction. A measurement system measures a position of the reticle surface in the optical axis direction. Information is generated on a position of each measurement point of the surface in the scanning direction with respect to which the measurement system measures a surface position based on pattern information. The measurement performed with respect to each measurement point is used to obtain reticle shape information. The position of the reticle stage and operation of the measurement system is controlled based on the generated information and the reticle stage position information.