At least one exemplary embodiment is directed to an apparatus which
includes an original stage, to hold an original, which moves in a scan
direction, an illumination optical system configured to illuminate the
original held by the original stage with exposure light, a substrate
stage configured to hold a substrate and to move in a scan direction, a
projection optical system configured to project a pattern of the original
onto the substrate with the exposure light, and an irradiation unit
configured to irradiate the original held by the original stage.
Irradiation by the irradiation unit and movement of the original stage in
the scan direction are carried out substantially in parallel with each
other so as to remove a contaminant on the original.