A method of implanting a vertebral implant in a void between a pair of vertebral endplates comprises positioning the vertebral implant between the vertebral endplates and coupling an implantation tool to the vertebral implant. The method further comprises actuating the implantation tool to generate alternating motion relative to the vertebral endplates. The alternating motion has a speed and creates a displacement of the vertebral implant. The method further comprises seating the vertebral implant into a profile formed in at least one of the vertebral endplates and decoupling the implantation tool from the vertebral implant. The vertebral implant remains implanted in the at least one vertebral endplate.