According to an aspect of the invention, to completely planarize the outermost surface of a laminated structure by appropriately performing a planarizing process, such as a CMP process, in an electro-optical device, such as a liquid crystal device, an electro-optical device includes TFTs that constitute driving circuits to drive data lines and scanning lines that are arranged in a peripheral region around an image display region, and an interlayer insulating film formed on the data lines, scanning lines, TFTs, and the driving circuits. In the interlayer insulating film formed in the peripheral region, after an etching process is performed on at least portions corresponding to regions in which the driving circuits are formed, a CMP process is performed on the peripheral region and the image display region.