A SiC die with Os and/or W/WC/TiC contacts and metal conductors is
encapsulated either alone or on a ceramic substrate using a borosilicate
(BSG) glass that is formed at a temperature well below upper device
operating temperature limits but serves as a stable protective layer
above the operating temperature (over 1000.degree. C., preferably
>1200.degree. C.). The glass is preferably 30-50%
B.sub.2O.sub.3/70-50% SiO.sub.2, formed by reacting a mixed powder,
slurry or paste of the components at 460.degree.-1000.degree. C.
preferably about 700.degree. C. The die can be mounted on the ceramic
substrate using the BSG as an adhesive. Metal conductors on the ceramic
substrate are also protected by the BSG. The preferred ceramic substrate
is AIN but SiC/AIN or Al.sub.2 0.sub.3 can be used.