An exposure apparatus configured to expose a substrate to light via a reticle. The apparatus includes a projection optical system configured to project a pattern of the reticle onto the substrate, a nozzle configured to supply liquid to a region between the projection optical system and the substrate where the light passes, and a circulation system configured to circulate liquid to be supplied to the nozzle. The circulation system includes (i) a tank configured to store an externally supplied liquid, (ii) a first flow path configured to supply liquid from the tank to the nozzle, (iii) a thermoregulator configured to thermoregulate a temperature of liquid in the first flow path, and (iv) a second flow path configured to supply liquid to the tank from a branched point of the first flow path between the nozzle and the thermoregulator.