Provided are example embodiments of the invention including a range of polymer structures suitable for incorporation in barrier compositions for use, for example, in immersion photolithography in combination with a suitable solvent or solvent system. These polymers exhibit a weight average molecular weight (Mw) of 5,000 to 200,000 daltons and may be generally represented by formula I: ##STR00001## wherein the expressions (1+m+n)=1; 0.1.ltoreq.(1/(1+m+n)).ltoreq.0.7; 0.3.ltoreq.(m/(1+m+n)).ltoreq.0.9; and 0.0.ltoreq.(n/(1+m+n)).ltoreq.0.6 are satisfied; R.sub.1, R.sub.2 and R.sub.3 are C.sub.1 to C.sub.5 alkyl, C.sub.1 to C.sub.5 alkoxy and hydroxyl groups; and Z represents an alkene that includes at least one hydrophilic group. Barrier coating compositions will include an organic solvent or solvent system selected from C.sub.3 to C.sub.10 alcohol-based organic solvents, C.sub.4 to C.sub.12 alkane-based organic solvents and mixtures thereof.