An Ir film, an IrO.sub.x film, a Pt film, a PtO film and a Pt film are formed, and thereafter a PLZT film is formed. Then, heat treatment at 600.degree. C. or lower is performed by the RTA method in an atmosphere containing Ar and O.sub.2 to thereby crystallize the PLZT film. Subsequently, an IrO.sub.x film and an IrO.sub.2 film are formed. Then, these films are patterned at once. Thereafter, an alumina film is formed as a protective film. Subsequently, heat treatment at 650.degree. C. for 60 minutes in an oxygen atmosphere is performed as recovery annealing. Note that no heat treatment is performed from the crystallization of the PLZT film to the recovery annealing.