Providing a method and apparatus for efficiently irradiating a uniform
laser light on an irradiation surface even when a laser light of high
coherence or a large size substrate is used. The laser irradiation
apparatus of the invention comprises a laser; means for dividing a laser
light emitted from the laser into plural laser beams; means for
synthesizing the laser beams on the irradiation surface or place in the
vicinity thereof thereby forming a laser light having a periodical energy
distribution; and means for moving the substrate relative to the laser
light. Such a laser irradiation apparatus may be used to anneal the
overall surface of a semiconductor film.