The target for the transparent conductive thin film having indium oxide as
its major component and containing tungsten and/or molybdenum, obtained
by forming a body of indium oxide powder, and tungsten oxide power and/or
molybdenum oxide powder and then heating or sintering the formed body
such that the thin film after sputtering has indium oxide as the main
component and contains tungsten and/or molybdenum with an atomic ratio
(W+Mo)/In of 0.0040 to 0.0470, whereby a transparent conductive thin film
having excellent surface smoothness and low specific resistance of
6.0.times.10.sup.-4 .OMEGA.cm or less, and whose surface smoothness and
specific resistance properties do not change even when heated at
170.degree. C. is provided.