A photosensitive resin composition for optical waveguide formation, comprising: (A) a di(meth)acrylate having the structure represented by the following general formula (1): ##STR00001## (wherein R.sup.1 is --(OCH.sub.2CH.sub.2).sub.m--, --(OCH(CH.sub.3)CH.sub.2).sub.m--, or --OCH.sub.2CH(OH)CH.sub.2--; X is --C(CH.sub.3).sub.2--, --CH.sub.2--, --O--, or --SO.sub.2--; Y is a hydrogen atom or a halogen atom; m is an integer of 0 to 4); (B) a mono(meth)acrylate having the structure represented by the following general formula (2): ##STR00002## (wherein R.sup.2 is --(OCH.sub.2CH.sub.2).sub.p--, --(OCH(CH.sub.3)CH.sub.2).sub.p--, or --OCH.sub.2CH(OH)CH.sub.2--; Y is a hydrogen atom, a halogen atom, Ph-C(CH.sub.3).sub.2--, Ph-, or an alkyl group having 1 to 20 carbon atoms; p is an integer of 0 to 4; Ph is a phenyl group); and (C) a photoradical polymerization initiator. The composition has excellent patterning ability, refractive index, heat resistance, and transmission characteristic.